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Multi-angle Reflectometry & Ellipsometry

Reflection and Transmission

Spectroscopic Ellipsometry

Spectroscopic Reflectometry

CD Metrology

Chromatic Confocal Spectroscopy

 

 

 

 

 

 

 

 

FilmTekTM Metrology Instruments for Thin Film Thickness and Refractive Index Measurement

 

 

FilmTek™ 2000SE Spectroscopic Ellipsometer

 

FilmTek™ Spectroscopic Ellipsometer Software

 

FilmTek™ 2000 PAR_SE Spectroscopic Ellipsometer

 

FilmTek™ 3000 PAR-SE Spectroscopic Ellipsometer with AutoLoader

 

 

FilmTek™ CD 

 Spectroscopic Ellipsometer with Scatterometry

 

FilmTek™ 4000-A

 Multi-AngleSpectroscopic Ellipsometer

 

FilmTek™ 6000 PAR-SE

Multi-Angle Spectroscopic Ellipsometer

 

FilmTek™ SE

Spectroscopic Ellipsometer

 

FilmTek™ spectrophotometry-based metrology systems from Scientific Computing International (SCI) have long set the standards for thin film measurement.  Now — our FilmTek™ 4000 Series "raises the bar" by delivering 100 times the resolution of the best non-contact method for thin film measurement, and 10 times the resolution of the best prism coupler contact systems.  It's the result of our patented DPSD™ (Differential Power Spectral Density) technique.  And it's the latest example of how SCI is leading the thin film measurement field by raising  performance to a new level — while offering systems that are truly affordable for virtually every application.

 

Widest Film Thickness Measurement, Layer, & Spectral Ranges

FilmTek™ metrology systems come in a variety of configurations, and depending on the model can measure reflection, reflection and transmission, multiple angle reflection, spectroscopic ellipsometry, and generalized ellipsometry data.  FilmTek™ systems provide peak performance for thin film measurement from very-thin to very-thick films (up to 250 microns).  It's achieved by high wavelength resolution detectors combined with low cone angle optical design and apertures to limit measurement spot size.  Depending on the films involved, FilmTek™ systems can characterize up to fifteen layers, including film thickness, refractive index, and extinction coefficient.  And they all offer a wavelength measurement range from 190 to 1700 nm using our proprietary dispersion model.

 

Easy-to-Use Spectroscopic Ellipsometers, Reflectometers, and Multiple Angle Reflectometers

Our complete, turn-key systems are designed for simple, efficient, trouble-free push-button operation.  The powerful software was designed to put measurements and answers just a click away.  And to help characterize and control deposition processes, it includes such capabilities as 2D and 3D contour and surface graphic plotting, a customizable database interface, and the ability to be controlled by a host computer.  Versatile, flexible, reliable standard and custom FilmTek™ systems are available in a variety of configurations — from manual table top models, to fully automated systems with robotic cassette transfer and pattern recognition.  All are designed for optimum accuracy and repeatability.  They're easy to calibrate and operate.  And, with features like our unique optical design with no moving parts, they deliver long-lasting, reliable, trouble-free performance.

 

 Affordable Thin Film Measurement Systems for Virtually Every Budget

 A variety of configurations are offered in the standard FilmTek™ spectroscopic ellipsometer, reflectometer, and multiple angle reflectometer family.  SCI also develops customized models to meet special needs.  And they're all priced to fit most budgets.

  •  FilmTek™ 1000 / 1000M / 1500 models are accurate and economical thin film measurement systems for measuring film thickness, refractive index, and extinction coefficient.  Collects reflection data at normal incidence in the visible to NIR, and is ideal for film thickness measurement.  The FilmTek™ 1500 adds transmission mode measurements to reflection and is ideal for films on transparent substrates.
  •  FilmTek™ 2000 / 2000M / 2000 PAR models augment those thin film measurement capabilities to encompass surface roughness and reflection at normal incidence from deep UV to NIR.  Options include optics for small spot size measurements based on a microscope design (FilmTek™ 2000M) or parabolic mirrors (FilmTek™ 2000 PAR). 
  •  FilmTek™ 3000 / 3000M / 3000 PAR measures transmission and reflection of films deposited on transparent substrates. These thin film measurement systems are ideally suited for measuring the thickness and optical constants of very thin absorbing films.  The FilmTek™ 3000M has a small spot size (40 µm) and can be equipped with a large custom stage for flat panel display applications.
  •  FilmTek™ 2000SE / 3000SE is a high performance spectroscopic ellipsometer that measures from the deep UV to NIR.  Based on a rotating compensator design, the FilmTek™ 2000SE spectroscopic ellipsometer combines spectroscopic ellipsometry with normal incidence DUV reflectometry to make it ideally suited for measuring the film thickness and optical constants of very thin films.  The FilmTek™ 3000SE spectroscopic ellipsometer adds transmission measurement capability in addition to spectroscopic ellipsometry and multiple angle reflectometry.  The FilmTek™ 2000SE spectroscopic ellipsometer utilizes SCI's material modeling software to provide an affordable and reliable thin film measurement tool for the simultaneous measurement of film thickness, refractive index, and extinction coefficient.
  • FilmTek™ 2000M TSV provides fast, accurate, and repeatable high-throughput TSV depth measurements necessary to ensure high yield during TSV fabrication.  FilmTekTM 2000M TSV can readily determine etch depth for via structures with diameters greater than 1 µm up to a maximum etch depth of 500 µm.  The FilmTekTM 2000M TSV can also be used for the measurement of height or depth, critical dimension (CD), and film thickness for MEMS, microbumps, trenches, and a variety of other structures and applications.
  •  FilmTek™ 4000 is our most advanced model for thick film measurement applications.  It incorporates multiple detectors positioned at different angles of incidence — plus our patented multi-angle Differential Power Spectral Density analysis capability — to accurately measure the index of refraction with a resolution of 0.00002.  That's 100 times the performance of the best non-contact method, 10 times that of the best prism coupler contact systems.  The FilmTek™ 4000 can measure birefringence of anisotropic materials.  With its hot plate option, it can characterize the index of refraction and thermal expansion of a film as a function of temperature.  And its spectroscopic ellipsometer option allows measurement of very thin films.  A prime application for this system is measuring the index of refraction and thickness of planar waveguide films.
  •  FilmTek™ CD is a cost effective solution for non-destructive optical CD metrology applications, accurately and simultaneously determining period, line width, trench depth, and sidewall angle.  Based on technology combining multiple-angle polarized spectroscopic reflection and generalized spectroscopic ellipsometry, FilmTek™ CD measures Psi (y, ysp, yps), Delta (D, Dsp, Dps), Rs, Rp, Rsp, and Rps at 0 and 70 degrees to provide highly accurate measurements of profile information and film-thickness with a single tool.  FilmTek™ CD can also be used to characterize biaxial (anisotropic) materials.
  •  FilmTek™ 6000 PAR-SE is our most advanced thin-film metrology system.  It leverages the combination of new proprietary Multi-Angle Differential Polarimetry technology with SCI’s patented Differential Power Spectral Density technology to provide an optical thin film metrology tool with the best resolution, accuracy, and repeatability in the industry.  The FilmTek 6000 PAR-SE utilizes spectroscopic reflection (190nm-1700nm) of polarized light at multiple angles to independently measure film thickness and refractive index.  By independently measuring refractive index and film thickness, the FilmTek 6000 PAR-SE is far more sensitive to changes in films, particularly films within multi-layer stacks, than existing metrology tools that rely on conventional ellipsometry or reflectometry techniques.  Additionally, the FilmTek 6000 PAR-SE has a small measurement spot size to allow for measurement directly on product wafers (measures within a 50x50 micron feature).  Optional generalized ellipsometry is available for anisotropy and optical CD measurement.

 

Reflectance and Power Spectral Density Analysis

 

Analysis of polyimide film coating a thermal oxide film grown on a silicon wafer.

 

Power Spectral Density analysis of

 polyimide and oxide films.

 

FilmTekTM 4000 High Precision Measurement of Refractive Index

This unique FilmTek™ 4000 capability employ’s our patented DPSD (Differential Power Spectral Density) technique.  Spectroscopic reflection data are gathered at normal incidence and 70 degrees.  PSD processing results in two peaks in the Power Spectral Density domain.  The ratio of their positions is a function of the index of refraction of the film, and the angle of incidence of the oblique measurement.  This ratio is used to calculate the index.  Once the index is known, the thickness can be calculated from the optical thickness of the normal incident peak.

 

Differential Power Spectral Density analysis of an oxide film.

 

Index Map @ 1550nm of a doped oxide

 measured with FilmTek™ 4000.

 

 SiO2 Film Properties vs Temperature

With the hot plate option, the FilmTek™ 4000 can characterize the index of refraction and thermal expansion of a film as a function of temperature.

 

Measured by FilmTek™ 4000 with heating chuck during one heat-cool cycle.

 

FilmTekTM Surface Roughness Measurement

Fast, dependable, and non-contact, FilmTek™ measures surface roughness and damage with excellent correlation to other measurement techniques such as atomic force microscopy (AFM).

 

FilmTek™ 2000 vs AFM surface roughness measurement.

 

SCI Dispersion Model

Our dispersion model is derived from quantum mechanical principles and correctly obeys the Kramer-Kronig relationship.  It is applicable to metallic, semiconductor, amorphous, crystalline, and dielectric materials.  A broad array of single layer and multilayer films have been successfully analyzed, including:

 

• SiNx • DLC
• SiOxNx • Low K Dielectrics
• Polysilicon • High K Dielectrics
• PSG • Photoresist
• BPSG • Polyimide
• ITO • SOG
• a-Si • Porous Films
• a-c:H • Films used for manufacturing thin film heads

 

 Substrate examples include:

 

• Silicon • GaAs
• SOI • Glass
• SOS • Aluminum
• InP • Ge

 

By employing a dispersion model covering the entire wavelength range of the measurement, the number of variables or parameters required to model optical response is reduced, eliminating the potential for multiple solutions.

 

FilmTek™ Spectroscopic Ellipsometer, Reflectometer, and Multiple Angle Reflectometer Configurations

We offer a variety of configurations and options to fit every need from R&D to high volume manufacturing in controlled environments.

 

They include:

  • Standard probe head (2 mm spot size)
  • Microscope based (down to 5 µm spot size)
  • Reflection mode measurements
  • Transmission mode measurements
  • Spectroscopic ellipsometry measurements
  • Automated stage
  • Cassette to cassette robotic transfer
  • SMIF box
  • Pattern recognition
  • Heating chuck
  • In-situ; for integration with process equipment
  • Windows based operating system
  • Menu-driven, user friendly software

SCI's products are offered in three categories; stand-alone FilmTek™ film metrology systems, film design and analysis software, and Integrated Metrology Modules. The latter is only offered to OEM companies on a project by project basis.

 

FilmTek™ Thin Film Measurement Systems

FilmTek™ metrology systems are offered in a variety of configurations and capabilities in order to match every film measurement need and budget.  These thin film measurement systems are computer controlled and offer full automation through simple to use recipe-based control software.  The measurements are non-contact, and most can take place in as little as one second.  The following table summarizes some of the features of the standard models.  The large array of available options make it possible to tailor a FilmTek™ ellipsometer, reflectometer, and multiple angle reflectometer systems according to the exact customer requirements.

 

 

Measurement Features
FilmTek™ 1000 / 1500
FilmTek™ 2000 / 3000
FilmTek™ 2000SE / 3000SE
FilmTek™ 4000 / 4500
Index of Refraction
(at 2µm thickness)
±0.005
±0.002
±0.0002
±0.00002
Thickness Measurement Range
10nm-200µm
5nm-200µm
1Ĺ-200µm
3nm-350µm
Maximum Spectral Range (nm)
380-1000
190-1700
190-1700
190-1700nm
Standard Spectral Range (nm)
380-1000
240-1000
240-1000
380-1000nm
Reflection
Transmission
(1500)
(3000)
(3000)
(4500)
Spectroscopic Ellipsometry
 
 
 
Power Spectral Density
Multi-angle Measurements (DPSD)
 
 
TE & TM Components of Index
   
 
Multi-layer thickness
Index of Refraction
Extinction (absorption) Coefficient
Energy band gap
 
Composition
 
Crystallinity
 
Inhomogeneous Layers
 
Surface Roughness
 
A variety of options can extend these standard measurement capabilities.

 

 

 

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